Characterization of c-Si Texturization in Wet KOH/IPA and Its Effect on Cell Efficiency

Wafer surface texturization has become a key process in solar cell manufacturing. This paper presents the experiments we conducted to study the effect of wet process in controlling the texturization parameters, e.g. dimensions and density. It is theorized that the pyramids’ sizes, density and distribution correlate to the cell efficiency through maximizing the light absorbance. The data show that the higher the etch rate the higher the reflectance and the less distribution of the pyramids size. The efficiency was shown not to be strongly correlated to reflectance. However, the cell current Isc increases with smaller and uniformly-distributed pyramids. The results also confirm the dynamics of the process and the need for more in-depth study to fully understand the mechanism by which the texturization patterns and size could be better engineered.