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The influence of electrolytic conditions on the copper electrowinning was studied in 5.0 kmol m−3 NH3, 1.0 kmol m−3 (NH4)2SO4 and 0.50 kmol m−3 Cu(I) at 293-298 K. Copper deposits potentiostatically obtained on the copper plate electrode at −0.30 and −0.80 V (vs. SHE) for 20 hours were a smooth plate and a crowd of nodules with order of 10 μm in diameter, respectively. Galvanostatic electrolysis was also conducted using the copper plate electrode for 20 hours. The copper deposits were confirmed to be smooth at cathodic current density of 300 A m−2 and a crowd of nodules with order of 100 μm at 700 A m−2. The current efficiency of the electrowinning was estimated to be over 90% at all conditions.

Copper Electrowinning from Ammonia Solution Containing Cu(I) with Emphasis on the Morphology of the Deposits