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Titaniumdioxide (TiO2) Thin Films Have been Fabricated and Deposited on Ftoglass Substrates by Spray Pyrolysis Deposition (SPD) Method. the TiO2thin Films were Annealed at Four Different Temperatures for an Hour. Thetemperature was Set at 100°C, 300°C, 400°C and 500°C. Surface Morphology Andelectrical Properties of TiO2 Thin Films were Investigated Usingfesem and 2 Point- Probe I-V Measurement, Respectively. the FESEM Result Shows Thatthe Grain Size of the Tio2 increases when Annealed Temperatureincreases. for XRD Test Shows that the Crystallinity Improved with Theincreasing of Annealing Temperature. when the Annealing Temperature Increases,the Electrical Properties of TiO2 Also Change. the Result Shows Thatthe Optimum Temperature for Annealing of TiO2 Thin Film was 400°C.

applied mechanics and materials

Effects of Annealing Temperature of TiO&lt;sub&gt;2 &lt;/sub&gt;Thin Film Deposited by Spray Pyrolysis Deposition Method for Dye-Sensitized Solar Cell (DSSC) Application