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We present a numerical investigation of energy and charge distributionsduring electron-beam-induced growth of W nanostructures on SiO2 substratesusing Monte Carlo simulation of electron transport. This study gives aquantitative insight into the deposition of energy and charge in the substrateand in already existing metallic nanostructures in the presence of the electronbeam. We analyze electron trajectories, inelastic mean free paths, anddistribution of backscattered electrons in different deposit compositions anddepths. We find that, while in the early stages of the nanostructure growth asignificant fraction of electron trajectories still interact with thesubstrate, as the nanostructure becomes thicker the transport takes placealmost exclusively in the nanostructure. In particular, a larger depositdensity leads to enhanced electron backscattering. This work shows howmesoscopic radiation-transport techniques can contribute to a model whichaddresses the multi-scale nature of the electron-beam-induced deposition (EBID)process. Furthermore, similar simulations can aid in understanding the roleplayed by backscattered electrons and emitted secondary electrons in the changeof structural properties of nanostructured materials during post-growthelectron-beam treatments.

Simulation of electron transport in electron beam induced deposition of nanostructures