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In this article, we demonstrate the position-controlled hydrothermal growth of rutile TiO 2 nanorods using a new scanning probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO 2 film. This process scratches the film causing tiny anatase TiO 2 nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile nanocrystals and provide the growth of rutile TiO 2 nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO 2 nanostructures.

Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO2 nanorods

Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO₂ nanorods