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This work examines the profilometry characterization of fluorine doped tin oxide (FTO) film and mesoporous (MTiO2) film using organic dye from Senna plant as photosensitizer. Fluorine doped tin oxide (FTO) film was grown on the substrate using chemical vapour deposition method. Tin-iv-chloride (60%) and hydrofluoric acid (40%) were deposited to the substrate as precursors using two set of bubblers and Nitrogen gas was supply to the same pipe carrying the precursors as a carrier gas. The whole set up was connected to air compressor, which pumps air to the system. The deposited precursors (FTO) were later sintered at 550°C. The first flow meter deposition time is 6 minutes and the flow rate is one (1) litre per minute. The second flow meter connected to the system measured the volume of air that flows into the pipe per time. The grown fluorine doped tin oxide (FTO) film was characterized to find out the thickness and area of the spectra grown on the substrate.

Profilometry Analysis of Flourine Doped Tin Oxide (FTO) Film and Mesoporous (M-TiO2) Film Using Organic Dye from Senna Plant as a Photosensitizer