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The importance of polarization aberrations has been recognized and studied in numerous optical systems and related applications. It is known that polarization aberrations are particularly crucial in certain photogrammetry and microscopy techniques that are related to vectorial information—such as polarization imaging, stimulated emission depletion microscopy, and structured illumination microscopy. Hence, a reduction in polarization aberrations would be beneficial to different types of optical imaging/sensing techniques with enhanced vectorial information. In this work, we first analyzed the intrinsic polarization aberrations induced by a high-NA lens theoretically and experimentally. The aberrations of depolarization, diattenuation, and linear retardance were studied in detail using the Mueller matrix polar-decomposition method. Based on an analysis of the results, we proposed strategies to compensate the polarization aberrations induced by high-NA lenses for hardware-based solutions. The preliminary imaging results obtained using a Mueller matrix polarimeter equipped with multiple coated aspheric lenses for polarization-aberration reduction confirmed that the conclusions and strategies proposed in this study had the potential to provide more precise polarization information of the targets for applications spanning across classical optics, remote sensing, biomedical imaging, photogrammetry, and vectorial optical-information extraction.

Polarization Aberrations in High-Numerical-Aperture Lens Systems and Their Effects on Vectorial-Information Sensing