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Photopolymers can be used to fabricate different holographic optical elements, although maximization of the phase-shift in photopolymers has been a challenge for the last few decades. Different material compositions and irradiation conditions have been studied in order to achieve it. One of the main conclusions has been that with continuous laser exposure better results are achieved. However, our results show for the first time that higher phase-shift can be achieved using a pulsed laser. The study has been conducted with crosslinked acrylamide-based photopolymers exposed with a pulsed laser (532 nm). The increment of the phase-shift between the pulsed laser and continuous laser exposure is 17%, achieving a maximum phase-shift of 3π radians and a refractive index shift of 0.0084 at the zero spatial frequency limit, where monomer diffusion does not take place. This allows this photopolymer to be used in large-scale manufacturing.

Phase-Shift Optimization in AA/PVA Photopolymers by High-Frequency Pulsed Laser