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Silicon-carbon films have been deposited on silicon and Al 2 O 3 /Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.

Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism