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The self-assembly of a lamellar-forming polystyrene- block -poly(dimethylsiloxane) (PS- b -PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D₃). The number average molecular weight ( M  n ), polydispersity index ( M  w / M  n ) and PS volume fraction (φ ps ) of the DBCP were M  n  PS = 23.0 kg mol -1 , M  n  PDMS = 15.0 kg mol -1 , M  w / M  n = 1.06 and φ ps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λ L ) and the width of the PDMS features ( d  L ) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features.

nanomaterials

Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography