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This work proposes a detailed process of micro/nano-structure surface modification in relation to temperature field. In this paper, a femtosecond laser is used to induce the surface morphology of a silicon substrate. We provide a new method for the fabrication of a micro/nano-cantilever probe by controlling the aspect ratio of the silicon surface morphology. A computational method is used to investigate the mechanical behaviors of early perturbation to late-stage structure. A diffuse interface model is employed to describe the evolution and provide a general framework. The theoretical model of femtosecond laser control surface morphology is verified by the experiments. For systematic study, the model involves the interface energy and kinetics of diffusion. This method provides an effective way to improve the sensitivity of micro/nano-cantilever sensors.

Study for Laser Controlled Fabrication of Micro/Nano-Structures of Silicon Based on Multi-Physics Model