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The semiconductor industry uses a physical vapor-deposition process, with a nickel-tantalum (NiTa) alloy-sputtering target, to apply an amorphous NiTa thin film layer between the magnetic soft underlayer and substrate of a heat-assisted magnetic-recording hard disk drive. Currently, the alloy-sputtering target is produced through a hot-pressing (HP) process followed by a hot isostatic pressing (HIP). In this study, we demonstrate a better process for producing the sputtering targets, using laser powder-bed fusion (L-PBF) followed by vacuum heat treatment (VHT), to produce alloy targets with superior microstructural characteristics that will produce better-quality thin films. We compare as-fabricated (just L-PBF) specimens with specimens produced by L-PBF and then annealed at different conditions. Where the as-fabricated specimens are characterized by columnar dendrites, annealing at 1275 °C for 4 h produces a uniform equiaxed grain microstructure and a uniformly dispersed fcc Ta precipitate. In addition, the average microhardness value is reduced from 725 ± 40 to 594 ± 26 HV0.2 and the maximum compressive residual stress is reduced from 180 ± 50 MPa to 20 ± 10 MPa as the result of dislocation elimination during the recovery and recrystallization process. Finally, due to microstructure recrystallization, the VHT-treated L-PBF NiTa specimens exhibit a smaller grain size (2.1 ± 0.2 µm) than the traditional HIP-treated HP specimens (6.0 ± 0.6 µm).

Effect of Vacuum Heat Treatment on the Microstructure of a Laser Powder-Bed Fusion-Fabricated NiTa Alloy