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Gas separation membranes were fabricated with varying trimethylmethoxysilane(TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at650 °C and atmospheric pressure. The membrane had a high H 2 permeance of 8.3 × 10 -7 mol m -2 s -1 Pa -1 with H2/CH4 selectivity of 140 and H 2 /C 2 H 6 selectivity of 180 at 300 °C. Fourier transforminfrared (FTIR) measurements indicated existence of methyl groups at high preparationtemperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derivedmembranes than of a pure TEOS-derived membrane. Temperature-dependence measurements ofthe permeance of various gas species were used to establish a permeation mechanism. It was foundthat smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N 2 ,CO 2 , and CH 4 ) followed a gas translational diffusion model.

Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation