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A metamodeling technique based on Bivariate Cut High Dimensional Model Representation (Bivariate Cut HDMR) is implemented for a semiconductor packaging design problem with 10 design variables. Bivariate Cut-HDMR constructs a metamodel by considering only up to second-order interactions. The implementation uses three uniformly distributed sample points ( s = 3) with quadratic spline interpolation to construct the component functions of Bivariate Cut-HDMR, which can be used to make a direct comparison with a metamodel based on Central Composite Design (CCD). The performance of Bivariate Cut-HDMR is evaluated by two well-known error metrics: R -squared and Relative Average Absolute Error ( RAAE ). The results are compared with the performance of CCD. Bivariate Cut HDMR does not compromise the accuracy compared to CCD, although the former uses only one-fifth of sample points (201 sample points) required by the latter (1045 sample points). The sampling schemes and the predictions of cut-planes and boundary-planes are discussed to explain possible reasons for the outstanding performance of Bivariate Cut HDMR.

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Implementation and Performance Evaluation of a Bivariate Cut-HDMR Metamodel for Semiconductor Packaging Design Problems with a Large Number of Input Variables