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In order to investigate the role of chloride ion in the corrosion film formation of copper and its evolution over time, the initial corrosion behavior of copper in neutral 3.5% (wt.) NaCl solution was characterized by in-situ Raman spectroscopy along with electrochemical tests. The results demonstrated that the cuprous chloride complexes, such as CuCl and CuCl 2 - were produced through electrode processes, while the cuprite, Cu 2 O seemed to be formed via the chemical precipitation reaction instead of a direct electrochemical transformation from the metal matrix or CuCl and it occurred rather slowly. At the open circuit potential, the chlorides were generated first in the initial 2 h and then they transformed to the oxides with the CuCl 2 - content in the interface increasing. The in-situ Raman characterization directly evidenced the previously reported mechanism of growth of oxide layers on copper surfaces in neutral Cl - media and clearly showed the formation of a corrosion product film and its evolution over time. The electrochemical tests corresponded to the results of in-situ Raman characterization well.

In-Situ Raman Characterization of Initial Corrosion Behavior of Copper in Neutral 3.5% (wt.) NaCl Solution