English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

The effect of remnant polarization (Pr), coercive electric-field (Ec), and parasitic capacitance of baseline device on the drive current (ION) of a metal-ferroelectric-metal-insulator-semiconductor (MFMIS) negative capacitance FinFET (NC FinFET) was investigated. The internal gate voltage in the MFMIS structure was simulated considering gate leakage current. Using technology computer aided design (TCAD) tool, the device characteristic of 7 nm FinFET was quantitatively estimated, for the purpose of modeling the baseline device of MFMIS NC FinFET. The need for appropriate parasitic capacitance to avoid performance degradation in MFMIS NC FinFET was presented through the internal gate voltage estimation. With an appropriate parasitic capacitance, the effect of Pr and Ec was investigated. In the case of Ec engineering, it is inappropriate to improve the device performance for MFMIS NC FinFET without threshold voltage degradation. Rather than Ec engineering, an adequate Pr value for achieving high ION in MFMIS NC FinFET is suggested.

MFMIS Negative Capacitance FinFET Design for Improving Drive Current