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As a promising candidate in space radiation hardened applications, silicon-on-insulator (SOI) devices face the severe problem of total ionizing dose (TID) radiation because of the thick buried oxide (BOX) layer. The direct-current current–voltage (DCIV) method was applied for studying TID radiation of SOI metal–oxide–semiconductor field–effect transistors (MOSFETs) with different manufacture processes. It is found that the peak of high-voltage well (PX) devices shows a larger left-shift and a slower multitude increase along with radiation dose, compared with that of low-voltage well (PV) devices. It is illustrated that the high P-type impurity concentration near back interface makes it more difficult to break up silicon hydrogen bonds, which gives the PX devices superiority in resisting the build-up of interface traps. The study results indicate that increasing doping concentration of the body region near the back-gate interface might be an alternative radiation hardening technique of SOI MOSFET devices to avoid the parasitic back transistors’ leakage.

electronics

Applications of Direct-Current Current–Voltage Method to Total Ionizing Dose Radiation Characterization in SOI NMOSFETs with Different Process Conditions