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As the requirements in terms of crystal defect/quality and production yield are generally contradictory, it is necessary to develop methods in order to find the best compromise for the growth conditions of a given crystal. Simple growth-rate/temperature-gradient charts are a possible tool in this respect. After the recall of the classical analytical equations useful for describing the process and defect engineering, a simple pedagogic case explains the building and use of such charts. The more complex application to the directional casting of photovoltaic Si necessitated the development of new physical models for twinning and equiaxed growth. This allowed plotting charts that proved useful for industrial applications. The conclusions discuss the drawbacks and advantages of the method. It finally proves to be a pedagogic tool for teaching crystal growth engineering.

Use of Growth-Rate/Temperature-Gradient Charts for Defect Engineering in Crystal Growth from the Melt