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Ion energy distributions (IEDs) play an important role in material processes and thin film deposition. We developed a newly designed multistep pulsed power supply (modulator) for the asymmetric bipolar pulsed power sputtering (ABPPS) technology and studied the effect of reverse bias voltage in improving the properties of thin films through Ti deposition. Using an ion energy analyzer, we confirmed IEDs and relative ion intensity under a reverse bias voltage of the modulator at the substrate position. A dense plasma was generated near the sputter target at reverse bias voltages above 300 V. Experiments were conducted by varying the bias voltage applied to the sputter target and the duty cycle of the modulator. Our results demonstrate that the in-house-built ABPPS system can be used to clean the sample surfaces without requiring additional energy sources or substrate bias and that thin films prepared using this system have a smoother surface than those prepared by conventional sputtering.

Measurement of Ion Energy Distribution and Deposition of Ti Thin Films Using ABPPS Technology on Glass Substrate