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Chemical vapor deposition (CVD) on metal foils is regarded as the most effective method to produce large-area graphene with properties in line with the requirements of an extensive range of electronic and optical applications. For the CVD of graphene, ethanol is a versatile carbon source alternative to the widely used methane. In this review we report on the current progress in this field showing how the CVD parameters can be modulated to gain full microstructural control on graphene grown on Cu foils. Using ethanol vapor, graphene can be grown as a continuous film with mono- or multi-layer thickness, and also in the form of isolated crystals on pre-oxidized Cu substrates. Overall, ethanol-CVD allows a controllable degree of crystallinity and tunable electrical/optical characteristics in the grown samples. In turn, this control translates into a superior versatility for device design and related applications.

Recent Advancements on the CVD of Graphene on Copper from Ethanol Vapor