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Xin Xiong 1, Yuki Shimizu 1,*, Xiuguo Chen 1,2 , Hiraku Matsukuma 1 and Wei Gao 1 1 Precision Nanometrology Laboratory, Department of Finemechanics, Tohoku University, Sendai 980-8579, Japan; xinxiong@nano.mech.tohoku.ac.jp (X.X.); xiuguochen@nano.mech.tohoku.ac.jp (X.C.); hiraku.matsukuma@nano.mech.tohoku.ac.jp (H.M.); gaowei@cc.mech.tohoku.ac.jp (W.G.) 2 State Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China * Correspondence: yuki.shimizu@nano.mech.tohoku.ac.jp; Tel.: +81-22-795-6950

applied sciences

Uncertainty Evaluation for Measurements of Pitch Deviation and Out-of-Flatness of Planar Scale Gratings by a Fizeau Interferometer in Littrow Configuration