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We report an approach to incorporate Ge into Cu2ZnSnSe4 using GeSe vapor during the selenization step of alloyed metallic precursors. The vapor incorporation slowly begins at T ≈ 480 °C and peaks at 530 °C, resulting in a Ge-based composition shift inside the previously formed kesterite layer. We initially observe the formation of a Ge-rich surface layer that merges into a homogeneous distribution of the incorporated element during the further dwelling stage of the annealing. This approach is very versatile and could be used in many similar fabrication processes for incorporating Ge into CZTSe-absorber layers. Because the vapor-based composition shift in the layer happens after the formation of the absorber film towards the end of the fabrication process, most process parameters and the precursor structure may not need any significant re-optimization. The careful integration of this step could help to reduce Sn-related deep defects and accompanying VOC losses. The best CZTGSe-power-conversion efficiency obtained in this series is 10.4 % (with EG = 1.22 eV, FF = 54%, JSC = 36 mA/cm2, VOC = 540 mV, VOCdef,SQ = 417 mV). These results demonstrate the potential of this approach for Ge incorporation into kesterite absorbers.

Vapor-Phase Incorporation of Ge in CZTSe Absorbers for Improved Stability of High-Efficiency Kesterite Solar Cells