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Femtosecond laser micromachining is becoming an established technique for the fabrication of complex three-dimensional structures in glass. The combination of laser writing and chemical etching increases the technique versatility by allowing the fabrication of hollow structures within the bulk material. The possibility to encompass both optical and fluidic components in a single substrate allows us to realize optofluidic devices usable in several application fields. Here, we present new investigations of laser-assisted etching in Eagle XG glass showing good etching conditions at low repetition rates, where thermal effects can be neglected, and low irradiation speeds, which allow for complex microchannel network formation.

Laser-Assisted Etching of EagleXG Glass by Irradiation at Low Pulse-Repetition Rate