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The demand for high-performance two-dimensional gas barrier materials is increasing owing to their potential for application in optoelectronic devices. These materials can help the devices maintain their properties over a long period. Therefore, in this study, we investigated the gas barrier performance of hexagonal boron nitride (h-BN) monolayers grown on copper foils via electrochemical polishing (ECP). The ECP treatment helped reduce the surface roughness of the copper foils. As a result, the nucleation density was reduced and highly crystalline h-BN monolayers were produced. The gas barrier performance of h-BN monolayers on copper foils with ECP was comparable to that of graphene. Our finding demonstrates the potential of monolayer h-BN as a high-performance and economical gas barrier material for organic-based optoelectronic devices.

Gas Barrier Performance of Hexagonal Boron Nitride Monolayers Grown on Copper Foils with Electrochemical Polishing