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This paper presents a method of utilizing a non-contact position sensor for the tilting and movement control of a rotor in a rotary magnetic levitation motor system. This system has been studied with the aim of having a relatively simple and highly clean alternative application compared to the spin coater used in the photoresist coating process in the semiconductor wafer process. To eliminate system wear and dust problems, a shaft-and-bearing-free magnetic levitation motor system was designed and a minimal non-contact position sensor was placed. An algorithm capable of preventing derailment and precise movement control by applying only control without additional mechanical devices to this magnetic levitation system was proposed. The proposed algorithm was verified through simulations and experiments, and the validity of the algorithm was verified by deriving a precision control result suitable for the movement control command in units of 0.1 mm at 50 rpm rotation drive.

Movement Control Method of Magnetic Levitation System Using Eccentricity of Non-Contact Position Sensor