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Phosphate (PO    4    3  -) modification of semiconductor photocatalysts such as TiO 2 , C 3 N 4 , BiVO 4 , and etc. has been shown positive effect on the enhancement of photocatalytic performance. In the present study, we demonstrate a novel one-pot surface modification route on Ag 3 PO 4  photocatalyst by ammonium phosphate [(NH 4 ) 3 PO 4 ], which combinesPO    4    3  -modification with ammonium (NH    4    +) etching to show multiple effects on the structural variation of Ag 3 PO 4  samples. The modified Ag 3 PO 4  photocatalysts exhibit much higher photocatalytic performance than bare Ag 3 PO 4  for the degradation of organic dye solutions under visible light irradiation. It is indicated that theNH    4    +etching favors the surface transition from Ag 3 PO 4  to metallic Ag nanoparticles, resulting in the fast capture of photogenerated electrons and the followed generation ofO  2   ·  −radicals. The strongly adsorbedPO    4    3  -on the Ag 3 PO 4  surfaces can further provide more negative electrostatic field, which improves the separation of photogenerated electron-hole pairs by inducing the holes to directly flow to the surface and then enhances the formation of reactive  · OH radicals. Furthermore, the photocatalytic performance of the modified Ag 3 PO 4  photocatalysts can be optimized by monitoring the concentration of (NH 4 ) 3 PO 4  that is 1 mM.

The Multiple Promotion Effects of Ammonium Phosphate-Modified Ag3PO4 on Photocatalytic Performance