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TbFeCo thin films sputtered from powdermetallurgical alloy targets in an in-line production system and a single disk coater for magneto-optical data storage media were investigated with regard to the impact of deposition parameters and target erosion. Layer composition and its uniformity can be estimated from determination of coercivity and compensation temperature by means of a Kerr-loap tracer. Our results for the static single disk process indicate that Tcomp is mainly influenced by cathode power (deposition rate). The effect of target aging was found to be small for both deposition techniques.

INFLUENCE OF TARGET AND PROCESS PARAMETERS ON TbFeCo THIN FILMS PRODUCED BY DYNAMIC AND STATIC SPUTTER DEPOSITION