English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

ZnO/Ag/SnO2 (ZAS) tri-layer films were prepared on glass substrates via RF and DC magnetron sputtering, and then the influence of the thickness of the ZnO and SnO2 layers on the optical and electrical properties of the ZAS films was investigated. As deposited ZnO 50 nm/Ag 10 nm/SnO2 50 nm films showed a higher figure of merit, 1.08 × 10 Ω, than the other films due to a high visible transmittance of 80.8% and a low resistivity of 1.21 × 10 Ωcm. From the observed results, it can be concluded that the ZnO 50 nm/Ag 10 nm/SnO2 50 nm tri-layer films can be used as a substitute for conventional transparent conducting oxide films in various opto-electrical applications. (Received March 20, 2019; Accepted April 4, 2019)

Influence of Film Thickness on the Electrical and Optical Properties of ZnO/Ag/SnO2 Tri-Layer Films