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Surfaces of layered VSe 2  crystals with self-assembled networks of nanostructures formed during the early stages of Cu deposition have been investigated by high-angle annular dark-field imaging in scanning transmission electron microscopy, energy-dispersive X-ray spectroscopy, and energy-loss near-edge structure measurements in electron energy-loss spectroscopy at high spatial resolutions. The investigations confirm that the nanostructures are elevated surface folds and that the deposited copper is rather uniformly distributed across the VSe 2  surface mesh regions and the nanostructure regions. The electron energy loss near-edge structure of the L 2.3  ionization edges depict that the electronic properties of Cu are modified in regard to metallic Cu, and that the electronic properties of V are modified in regard to VSe 2  layered crystals while the ionization edges of Se are largely unaffected. The observations are consistent with results of structure analyses and suggest that different types of Cu-rich crystalline intercalation compounds form at the surfaces upon Cu deposition.

Combined EELS, EDX, and STEM investigations of Cu-induced nanostrucutures and thin surface layer phases