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LaNi 5  films were deposited on a nickel substrate using a La 2 Ni 7  alloy target with a sputtering power,  W  S , of 50– 400 W at substrate temperature,  T  S , of 323–573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing  W  S  and increased with increasing  T  S . At low  W  S  and low  T  S , amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high  W  S  and low  T  S  exhibited only a ( hk  · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high  W  S  and high  T  S , the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing  W  S . On the other hand, the equilibrium pressure of the films decreased with increasing  W  S . The films deposited at 400 W represented a pressure plateau on the pressure –composition isotherms.

Fabrication and Characterization of Hydrogen Absorption LaNi 5 Alloy Films Sputtered on Nickel Substrate