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TiO 2  films were deposited on radio-frequency-biased substrates via direct current magnetron sputtering. Argon and oxygen were used as working and reactive gases, respectively. Ions produced in the plasma are accelerated towards the substrates due to the self-bias developed at the substrates. X-ray diffraction and atomic force microscopy reveal that as-deposited films are amorphous with low surface roughness and broad, low-intensity rutile peaks are observed for the films deposited with low bias (self bias ≤ −100 V) at low substrate temperature. The optical study shows blue shift in the band gap for the films deposited with substrate bias. The structural characterization, optical analysis, and dielectric properties confirm the possible coexistence of amorphous and rutile phases in the films deposited with low-biased substrate. These films are useful as optical coatings.

Microstructural, optical, and dielectric properties of nanocrystalline TiO 2 films prepared via ion-assisted magnetron sputtering