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We present two optical solutions being suitable for on-line fabrication control. The first technique is applicable to measure three dimensional profiles of microstructures at long working distance up to several tens of centimeters keeping the nanometer in-depth accuracy. The second is appropriate for the express space-resolved characterization of residual stress areas and microcracks in solar cell wafers.

New Interferometric Approaches for Process and Product Quality Control: Dedicated to Prof. Dr. Dr. hc. mult. Michael Kröning to his 65. birthday