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Argon Gas Cluster Ion Beam (ArGCIB) is now widely spread in the ˆeld of practical surface analysis, such as Xray photoelectron spectroscopy (XPS) and Time-of-Flight secondary ion mass spectrometry (TOFSIMS), because of its unique sputtering eŠect of low chemical degradation for organic materials. GCIB provides the lateral sputtering eŠect and the high sputtering yield of which are never achieved by monotonic Ar ion beam on organic materials, so that the low chemical degradation of organic materials with high depth resolution and high sputtering rate could be achieved. Of course, a study of the GCIB sputtering phenomena with chemically reactive gasses, instead of Ar gas, for the advanced materials is one of the interesting things from an academic point of view. But the ArGCIB technique is expected to use for more practical applications, especially in the industrial ˆeld. In this paper, some practical applications of ArGCIB with recent XPS and TOFSIMS instruments will be brie‰y introduced.

Argon Gas Cluster Ion Beam for Practical Surface Analysis