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Glancing-angle deposition method was successfully applied in three reactive plasma processes (reactive ion plating, reactive sputtering and reactive evaporation) in order to fabricate indium-nitride ˆlms with microvillus-like isolated nanocolumnar structures. We found that the shape controllability of the isolated nanocolumns could partly be ascribed to the preferred orientation of the crystalline nanocolumns. The microvillus-like structures made the electrochromic color change of the indium-nitride ˆlms much larger.

Fabrication of Microvillus-structured Nitride Films by Using Glancing-angle Deposition in Reactive Plasma Processes