English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

Effects of ultraviolet (UV) light irradiation on a polymer dry etching process have been investigated with the use of a low-energy mass-selected ion beam system. The effective etched depth of polymethylmethacrylate (PMMA) by CF3+ ion beam injection and/or UV light irradiation was evaluated from the decrement of PMMA film weight measured by a quartz crystal microbalance. A significant enhancement of the etched depth of PMMA was observed when a CF3+ ion beam was injected to PMMA substrate with UV light irradiation. The etched depth of PMMA during simultaneous irradiation of CF3+ ion beams and UV light was greater than the sum of those obtained from separate CF3+ ion beam or UV light irradiation processes.

Effects of Ultraviolet Light Irradiation on Etching of Polymethylmethacrylate by CF3+ Ion Beam Injections