English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

An indium-tin oxide (ITO) film surface with good surface roughness and work function was successfully achieved using an electron cyclotron resonance (ECR) plasma treatment. The mixture gases of nitrogen and oxygen were used as reactive gases. The film quality dependence on the bias voltage was investigated. The surface roughness and work function of an ITO film surface were simultaneously improved under a bias voltage of -60 V, in which the ion current was dominant. On the other hand, only work function of an ITO film surface became better at a bias voltage above 40 V, in which the electron current was dominant. This is due to the etching effect and the surface oxidation by excited species such as nitrogen ions and oxygen radicals generated in the ECR plasma.

Surface Modification of Indium-tin Oxide Thin Films by Electron Cyclotron Resonance Plasma Treatment