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The photocatalytic property of N doped TiO2 films was investigated by the methylene blue reduction test under UV light irradiation. The N doped TiO2 films were prepared as follows; first TiO2 films were prepared on a slide glass substrate by He ion beam assisted reactive deposition method, second N+2 ions were irradiated to TiO2 films at an energy of 5 keV with doses ranging from 1.0 •~ 1015 to 1.0 •~ 1017 ions/cm2. The distribution of N atoms showed a Gaussian like distribution and the maximum concentration was 15% at a dose of 1.0 •~ 1017 ions/cm2. The rate of transmittance change for blank of N doped TiO2 film showed higher value than that of TiO2 film under UV light irradiation. The rate increased with increasing of N dose. From XPS measurement and the methylene blue reduction test, it was shown that the photocatalytic property of ion beam irradiated TiO2 films depended on ion beam acceleration energy, dose and ion species.

Nitrogen Ion Beam Irradiation Effects on Photocatalytic Property of Titanium Oxide Thin Films Prepared by Ion Beam Assisted Deposition Method