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A low-energy ion beam deposition apparatus with a Freeman type sputter ion source was developed. It is useful to investigate the process of thin film formation under deposition of ions with a well-defined energy. Energy distributions of Ti+, Fe+, C+ ions were measured so that we estimated characteristics of the ion source. A titanium thin film produced in this apparatus is examined by means of elastic recoil detection analysis (ERDA) and X-ray diffraction (XRD).

Development of Freeman Type Sputter Ion Source and Application for Coatings.