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By Si film coating on stainless steel by radio frequency (RF) magnetron sputtering we have developed very low outgassing state where the outgassing rate of Si coated sample is one tenth of the uncoated electrolytically polished stainless steel sample. As a preliminary step to find other coating techniques for an inner wall of vacuum chamber, electron beam deposition was examined by small samples in this paper. Outgassing properties of small samples were measured by thermal desorption spectroscopy (TDS). The outgassing depends on the film structure that was determined by deposition angle. When a Si film was deposited at low incident angle, the film was dense and the outgassing rate was as low as a Si film deposited by sputtering, whereas the outgassing rate of a Si film deposited at large incident angle was larger than that of uncoated stainless steel.

Outgassing Properties of Stainless Steel Covered with Si Film by Electron Beam Deposition.