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Molybdenum-silicon (Mo/Si) X-ray multilayered mirrors were deposited onto Si substrates by dc magnetron sputtering. Internal stress in the films was investigated through the measurement of substrate deformation. When compressive stress was larger, a higher X-ray reflectivity was obtained for the Mo/Si multilayer mirror. However, when a large internal stress was produced in the films, the deflection of the substrate became larger. The substrate must be thickened in order to reduce its deflection. It is concluded that the deflection by internal stress, which deteriorates the precision of the mirror, can be neglected for substrates more than about 12 mm thick.

Internal Stress in Mo/Si X-Ray Multilayered Films Deposited by DC Magnetron Sputtering.