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B-N-C films were prepared by reactive sputtering of a graphite/boron carbide composite target in N2 atmosphere. The films prepared with various deposition parameters, such as position of the substrate, sputtering pressure, and N2 partial pressure of the sputtering gas, were studied using X-ray photoelectron spectroscopy and IR transmission spectroscopy. The carbon concentration of the films decreased with decreasing N2 partial pressure, while boron concentration increased with decreasing N2 partial pressure. By contrast, nitrogen and oxygen concentrations of the films were independent of N2 partial pressure. Based on the binding energies of 1s electrons for C, B, and N and IR spectra, the chemical bonds were discussed, and the formation of B-N and C-N bonds was confirmed.

Preparation of B-N-C Films by Reactive Sputtering of Graphite/Boron Carbide Composite Target.