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CHAPTER 1: INTRODUCTION CHAPTER 2: SAMPLE PREPARATION Hot Wire Chemical Vapor Deposition Decomposition Reactions Gas Phase Reactions Surface Reactions Electron Cyclotron Resonance Plasmas Combined ECR-HW CVD Reactor Thin Film Deposition Contact Deposition CHAPTER 3: CHARACTERIZATION METHODS UV NIS/NIR Spectroscopy Photosensitivity and μ-r Product Infrared Spectroscopy and Hydrogen Content Activation Energy Sub-Band Gap Absorption Space-Charge Limited Current Defect Measurement Substrate Temperature Characterization Vl

Growth and characterization of hydrogenated amorphous silicon prepared using a combined hot wire and electron cyclotron resonance plasma deposition technique