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This manuscript has been reproduced from the microfihn master. UMI films the text direct^ from the onginal or copy submitted. Thus, some thesis and dissertation copies are in typewriter face, while others may Hie quality of diis reproduction is dqiendoit upon the quality of the copy submitted. Broken or indistinct print, colored or poor quality illustrations and photographs, print bleed^irough, substandard marginc^ and UDpraper alignment can adverse^ affect reproduction. In the unlikely, event th&t the author did not send UMI a complete manuscript and there are missing pages, these will be noted. Also, if unauthorized cqjyr^t material had to be removed, a note will indicate the deletion. Oversize materials (e.g., maps, drawings, charts) are reproduced by sectioning the ordinal, beginning at the upper left-hand comer and continuing from left to r^ht in equal sections with small overly Eadi original is also photographed in one exposure and is included in reduced form at the bade of the book. Photographs induded in the original manuscr^ have been reproduced xerographically in this copy. Higher quality 6" x 9" black and white photographic prints are available for ai^ photographs or illustrations appearing in this copy for an additional charge. Contaa UMI direct^ to order. be from ai^ type of compter printer.

Modeling x-ray scattering process and applications of the scattering model