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Metal organic chemical vapor deposition (MOCVD) growth of nickel‐doped zinc oxide (Ni‐doped ZnO) thin films on sapphire was  investigated.  The  structural  and  optical  properties  were  studied.  The  samples  were  grown  at  two  substrate temperatures  (i.e., 450 and 550  °C) and at  three  chamber pressures  (22, 30 and 100 Torr). The Ni‐doped ZnO  samples showed  the  (002) hexagonal  crystal  structure with  signs of  secondary phases  in X‐ray diffraction  (XRD) measurements. However, different XRD peak intensities were observed for these samples at different growth conditions with the same Ni flow  rate  injection  to  the  reaction  chamber.  The  samples  grown  at  different  growth  conditions  had  different  optical absorption  spectra.  Results  prove  that  the  growth  at  a  low  pressure  and  temperatures  close  to  the  decomposition temperature  of  the  precursors  resulted  in  an  optimum  dopant  incorporation,  sharp  absorption  band  edges,  and  good crystalline quality.

es materials and manufacturing

Optical and Structural Properties of Nickel Doped Zinc Oxide Grown by Metal Organic Chemical Vapor Deposition (MOCVD) at Different Reaction Chamber Conditions