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Toward adding specific functions to materials surface, submicron-size periodic structures were fabricated onto glass substrates by photochemical polymerization. A laser diode with continuous wave at 405 nm was used as a light source for the polymerization. Backside laser irradiation was utilized for inducing the photochemical polymerization in the close vicinity of a liquid-solid interface. Reactive liquid mixture composed of pentaerythritol triacrylate and 2-isopropylthioxanthone, those are used as an acrylic monomer and a photoinitiator, respectively, was set onto an aminosilane coated glass substrate. To confine the region where the polymerization occurs in the vicinity of the liquid-solid interface, reactive mixture containing high concentration of photoinitiator was employed. Optical penetration depth was decreased to ca. 30 μm. This confinement is indispensable for the present method to fabricated submicron-size periodic structures. A laser beam was once divided into four beams. Then, two or four beams were used for backside irradiation with interference. Incident angles of each divided beam were set to be 12 degrees in all experiments. Upon two beam irradiation, fringe structures with a period of 0.9 μm could be fabricated. Meanwhile, upon four beam irradiation, two-dimensional array of dot structures with a diameter of 0.7 μm was successfully fabricated.

Direct Fabrication of Submicron-size Periodic Structures by Backside Irradiation