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A polymer that when used with a Suitable photoacid gen erator (PAG) forms a positive working photoresist. The polymer comprises of a tartaric polyanhydride backbone, an acetal protected 1.2 diol group; and a fused ring acetal group pendant to the backbone. The acetal protected C-hydroxy anhydride backbone structure, undergoes an efficient pho toacid catalyzed cleavage, which gives rise to Small molecu lar weight fragments which are readily dissolved in an aqueous base developer. This high contrast in Solubility allows high resolution images to be produced. The fused rings offer etch resistance and can be comprised of either an adamantone or norcamphor ring Structure. With the addition of a commercially available photo acid generator, the poly mer formulation forms a positive working photoresist that offers high contrast and resolution.

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist