English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Three-component chemically amplified photoresists which are consisted of a base resin, a photo acid generator and a dissolution inhibitor are promising because the high sensitivity and the high resolution can be satisfied at the same time. We studied about the dissolution promotion effect of hydroquinone (HQ) in the exposed area. HQ is a model compound of the photo induced product of the dissolution inhibitor. We disclosed that HQ depressed a glass transition temperature (Tg) of the base resin and the sensitivity was improved by enhancing the dissolution rate in the exposed area. It is expected that the dissolution rate was promoted when the post exposure bake temperature exceeded Tg because the acid diffuse more easily.

Dissolution Promotion Effect of Addition of Low Molecular Compounds to Positive Tone Chemically Amplified Photoresist System