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Polyarylates containing diazonaphthoquinone (DNQ) structure as a photosensitive group in their chains (DNQ-introduced PArs (DPArs)) were synthesized by solution polycondensation using a DNQ having bisphenol structure (BADNQ1) as a diol monomer. Reaction development patterning (RDP) of the DPAr films afforded fine positive-tone patterns in shorter development time and higher resolution than that of the PAr film containing DNQ as an external photosensitive agent. It was also revealed that DPArs could be used as high-molecular-weight photosensitive agents and RDP-based pattern formation using the PAr/DPAr films was achieved in shorter development time and higher resolution than that using the PAr film containing low-molecular-weight DNQ. In addition, the PAr/DPAr film showed higher thermal and mechanical properties than the PAr/DNQ film. Furthermore, mechanical property of the PAr/DPAr was higher than that of the PAr itself, probably due to partial crosslinking induced by carbene species generated from DNQ during heating. Keyword: polyarylate, diazonaphthoquinone (DNQ), reaction development patterning (RDP), DNQ-introduced polyarylate (DPAr)

Utilization of Polyarylates Having Chemically Introduced Diazonaphthoquinone Structure for Reaction Development Patterning