Reactive-monolayer-assisted Thermal Nanoimprint Lithography with a Benzophenone-containing Trimethoxysilane Derivative for patterning Thin Chromium and Copper Films | Zendy

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Reactive-monolayer-assisted Thermal Nanoimprint Lithography with a Benzophenone-containing Trimethoxysilane Derivative for patterning Thin Chromium and Copper Films

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