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The peeling property of the resist pattern can be analyzed on the point of van der Waals (vdW) interaction between polymer aggregates and substrate by using the atomic force microscope (AFM). By treating the substrate with hexamethyldisilazane (HMDS), the interaction length between tip and substrate is shorten and weakened. It is clarified that a part of polymer aggregates condensed at pattern bottom have no contribution to the interaction with the substrate because the interaction length becomes short. At the resist-substrate interface, a certain vacancy among the polymer aggregates is found out. Based on the aggregation model, it is clarified that exposing the substrate to HMDS vapor acts to weaken the peeling strength of the resist pattern.

Van der Waals Interaction between Polymer Aggregates and Substrate Surface Analyzed by Atomic Force Microscope (AFM).